Integrated Circuit Industry


Gas name Integrated Circuit Industry Applications
Nitrous oxide (N₂O) Chemical Vapor Deposition (CVD) Oxidizer
Carbon dioxide (CO₂) Supercritical cleaning, immersion lithography, and oxidation, diffusion, and chemical vapor deposition during conductor manufacturing processes; after curing (using dry ice), the materials are applied to both short- and long-distance transportation of electronic cryogenic materials and precision components.
Ultra-pure ammonia (NH₃) Chemical vapor deposition, used as a passivation layer, etching mask, insulating layer, and capacitor dielectric layer, among other applications.
Germane GeH4 Fabrication of bipolar transistors, particularly the fabrication of heterojunction bipolar transistors.
Phosphine (PH3) Dopants, epitaxial growth, and chemical vapor deposition
Hydrogen (H₂) Reduction reaction, epitaxial growth, and oxygen removal in electronic microchip manufacturing
Oxygen (O₂) Oxidation process, plasma cleaning
Nitrogen (N₂) Inert protective gas, post-etching cleaning
Argon (Ar) Sputtering process protective gas, plasma stabilization