Special gas is field of Optoelectronics and microelectronics, especially the large scale integrated circuit, liquid crystal display, amorphous silicon based thin film solar cell, semiconductor light-emitting device and semiconductor manufacturing process indispensable source material. Its purity and cleanliness directly affect the quality, integration, technical specifications and yield of optoelectronic and microelectronic components, and fundamentally restrict the accuracy and accuracy of the circuits and devices.
Semiconductor lighting is in the ascendant industry. With the expansion of the compound semiconductor market, the demand for special gas shows a greater growth. Epitaxial growth requires a large number of ultra pure source and process gas. At present, the market share of compound semiconductors in Taiwan and Japan is relatively high. In recent years, China and South Korea have enjoyed a strong momentum of development, and the share of North America and Europe has also increased. Special gases used in semiconductor technology because of different kinds, strict quality requirements, production, filling, transportation and storage are technical and safety requirements, coupled with factors on the economic scale, we need the accumulation, in order to achieve scale production, so in our country present market situation, the supply capacity of small. Many types of gas research and development and production is still in the blank, the market supply mainly rely on imports.
Special gas used in LED industry
The semiconductor industry has a large variety of gas, high quality requirements and low consumption. Most of them are poisonous or corrosive gases. Varieties up to more than 100 kinds. The specialty gases of the semiconductor industry are classified according to their application, including:
(1) silicon gas: silicon containing silane class, such as silane (SiH4), two chlorine, two hydrogen silicon (SiH2Cl2), B silane (Si2H6) and so on.
(2) doped gas: boron, phosphorus, arsenic and other three and five atomic gas, such as three boron chloride (BCl3), three boron fluoride (BF3), phosphorus (PH3), arsenic (AsH3) and so on.
(3) etching cleaning gases: mainly halogen containing halogen and halogen carbon compounds, such as chlorine gas (Cl2), three fluorinated nitrogen (NF3), hydrogen bromide (HBr), four fluorinated carbon (CF4), six fluorine ethane (C2F6), etc..
(4): the reaction gas with carbon and nitrogen oxide system, such as carbon dioxide (CO2), ammonia (NH3), Nitrous Oxide (N2O) etc..
(5) metal vapor deposited gas: metal halide and organic alkane metal, such as six tungsten fluoride (WF6), trimethyl gallium (Ga (CH3) 3) and so on.
In the LED industry chain, epitaxial technology, equipment and materials are the key to epitaxial wafer fabrication technology. Practice has proved that MOCVD is a good technique for growth of epitaxial wafers, and also a practical technology for industrialization. At present, MOCVD process has become the basic technology for manufacturing most optoelectronic materials. The extension of technology need ultra pure specialty gases including high purity arsine, high purity phosphin, high purity ammonia, application of silane N doped GaAs production, and hydrogen chloride and chlorine is often used as an etching gas, argon, hydrogen, nitrogen carrier gas is a must. At the same time, the organic sources needed for epitaxial growth are mainly three methyl gallium, trimethyl indium, three methyl aluminum, two ethyl zinc, two methyl zinc, two cyclopentadienyl magnesium and so on. The quality of these products is getting higher and higher with the development of the existing technology.
In the growth of semiconductor compounds, in addition to pure special gas, also need part of the mixed gas, mainly including SiH4/H2. SiH4/ N2 as a membrane source, although the amount is not large, but the product quality requirements are extremely high, the preparation of mixed gas dew point to -95 degrees Celsius, only in this way can guarantee the growth rate of epitaxial growth.
Extended compound semiconductor industry, the rapid promotion of raw material market demand, including wafer, substrate, etching agent, process gas, metal organic compounds, testing and packaging materials such as the annual increase in the proportion of about 21%, while the process gas (arsine, phosphine, ammonia, hydrogen, nitrogen, argon, hydrogen chloride chlorine, etc.) the total material consumption of 8% metal organic compounds accounted for 8%.
Market trends in Specialty Gas Technologies in the LED industry
With the development of compound semiconductor technology and the acceleration of industrialization, the development and manufacturing technology of ultra pure special gas and organic source for epitaxy technology are continuously promoted. Mainly in: gas and organic source depth purification technology; clean processing technology for inner wall of gas cylinders and piping; ppm, ppb, PPT gas impurity detection technology; purification control analysis and detection technology ppb, PPT metal impurities; emission detoxification alarm technology; establishing the integrated pollution-free supply system; special preparation technology gas mixture; Technology supporting device and 0.01~0.002 m test particle filter technology. In order to meet the needs of the development of the downstream industry, special gas producers have gained more innovative technology in product purification, filling, testing and other aspects.
The development trend of special gases is also updated and improved with the development of photoelectron and microelectronic industries. Mainly for the product variety increasing, the emergence of new semiconductor materials, generation is a new generation of support material needs, special gas manufacturers focus on downstream chip factory needs to continue to introduce new varieties with semiconductor technology; at the same time, the special air quality continues to improve, with the maximum amount of ammonia in LED industry for example, the purity of high purity ammonia products from the technical indicators of the initial requirements for electronic grade (5N) to the bit level (5.5N), two Mbit (5.7N) to the development of the blue ammonia market is widely used in the production of gallium nitride (6.4N), the Gan technology demand